Development of Liquid Phase Deposition of Zirconium Oxide and Comparison to Silicon Dioxide

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Abstract:

In a recently-developed liquid phase deposition (LPD) process silicon dioxide thin films are deposited from a solution of hexafluorosilicic acid (H₂SiF₆) supersaturated with SiO₂ by boric acid (H₃BO₃) addition. In this study, an analogous process for zirconium oxide is attempted and compared to the process with SiO₂. The effects of boric acid, H₂ZrF₆ and ammonia concentrations are studied along with differing solution preparation routes. Films of 10-70 nm thickness are achieved, though the determination of their exact composition requires further study.

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This is a study I made in summer 2000 at Helsinki University of Technology Electron Physics Laboratory.

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